A new role for e-beam: electron projection

被引：5

作者：

Harriott, LR ^{[1
]}

机构：

[1] AT&T Bell Labs, Lucent Technol, Adv Lithog Res Dept, Murray Hill, NJ 07974 USA

来源：

IEEE SPECTRUM | 1999年 / 36卷 / 07期

关键词：

Cost effectiveness - Electron beam lithography - Electron scattering - Image processing - Imaging techniques - Masks - Photoresists;

D O I：

10.1109/6.774964

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Lucent Technologies is currently developing a project electron beam system for the 100-nm generation. The system, called Scalpel, uses a beam 1 mm2 across along with a scattering contrast mask and a combination of scanning and stepping for a marked improvement in throughput.

引用

页码：41 / 45

页数：5

共 6 条

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