Deposition of thin films by laser ablation

被引：0

作者：

Thareja, RK ^{[1
]}

Dwivedi, RK

Misra, A

Mitra, A

Neogi, A

机构：

[1] Indian Inst Technol, Dept Phys, Kanpur 208016, Uttar Pradesh, India

[2] Indian Inst Technol, Ctr Laser Technol, Kanpur 208016, Uttar Pradesh, India

来源：

METALS MATERIALS AND PROCESSES | 1998年 / 10卷 / 03期

关键词：

thin films; deposition; laser ablation;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin carbon and aluminum films were deposited on silicon and glass substrates using Nd:YAG laser (1.064, 0.532 and 0.355 mu m) wavelengths in an ambient atmosphere. Scanning Electron Microscopy (SEM), X-ray Diffraction (XRD), Transmission Electron Microscopy (TEM), Selected Area Electron Diffraction (SAED), Rutherford Back Scattering (RBS) and micro-Raman Spectroscopy were used to analyze and characterise the deposited films. The structure, composition and surface morphology of the deposited films are found to be strongly dependent on the choice and pressure of the ambient gas and the laser il radiance. Results obtained on the characterization of the laser ablated plasma plume using optical emission spectroscopy, ion probe measurements and ICCD photography are correlated with the deposited films characteristics. Effect of the magnetic field on the plasma plume is also discussed.

引用

页码：217 / 230

页数：14

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