Polymer photonic band-gaps fabricated by nanoimprint lithography

被引：7

作者：

Reboud, V. ^{[1
,2
]}

Kehoe, T. ^{[1
]}

Vivas, J. Romero ^{[3
]}

Kehagias, N. ^{[1
]}

Zelsmann, M. ^{[4
]}

Alsina, F. ^{[1
]}

Sotomayor Torres, C. M. ^{[1
,5
,6
]}

机构：

[1] Catalan Inst Nanotechnol, ES-08193 Barcelona, Spain

[2] CEA LETI Minatec Grenoble, F-38054 Grenoble, France

[3] Adam Mickiewicz Univ, Fac Phys, Surface Phys Div, PL-61614 Poznan, Poland

[4] CEA LETI MINATEC, LTM CNRS, F-38000 Grenoble, France

[5] ICREA, Catalan Inst Res & Adv Studies, Barcelona 08010, Spain

[6] Univ Autonoma Barcelona, Dept Phys, E-08193 Barcelona, Spain

来源：

PHOTONICS AND NANOSTRUCTURES-FUNDAMENTALS AND APPLICATIONS | 2012年 / 10卷 / 04期

关键词：

Photonic crystal; Photonic band gap; Nanoimpression; CRYSTALS;

D O I：

10.1016/j.photonics.2012.06.001

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We report on the fabrication and characterization of photonic band-gaps structures by nanoimprint lithography in a dye-doped polymer. Photonic band calculations show that photonic crystal slabs composed of a triangular array of polymer pillars could exhibit photonic band-gaps for the magnetic-like modes. The resulting structures show that the nanoimprint lithography process is well-suited to fabricate in a single-step process, these challenging photonic structures opening perspectives to realize integrated photonic band-gap circuits. (C) 2012 Elsevier B.V. All rights reserved.

引用

页码：632 / 635

页数：4

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