Stoichiometric Effect on Electrical, Optical, and Structural Properties of Composition-Tunable InxGa1-xAs Nanowires

被引:40
作者
Hou, Jared J. [1 ]
Wang, Fengyun [1 ]
Han, Ning [1 ]
Xiu, Fei [1 ]
Yip, SenPo [1 ]
Fang, Ming [1 ]
Lin, Hao [1 ]
Hung, Tak F. [1 ]
Ho, Johnny C. [1 ,2 ]
机构
[1] City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon, Hong Kong, Peoples R China
[2] City Univ Hong Kong, Ctr Funct Photon CFP, Kowloon, Hong Kong, Peoples R China
关键词
indium gallium arsenide; nanowires; two-step growth method; stoichiometry; composition tunable; field-effect mobility; INGAAS; GROWTH; FIELD; EPITAXY; UNIFORM; ARRAYS;
D O I
10.1021/nn304174g
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Ternary InGaAs nanowires have recently attracted extensive attention due to their superior electron mobility as well as the ability to tune the band gap for technological applications ranging from high-performance electronics to high-efficiency photovoltaics. However, due to the difficulties in synthesis, there are still considerable challenges to assess the correlation among electrical, optical, and structural properties of this material system across the entire range of compositions. Here, utilizing a simple two-step growth method, we demonstrate the successful synthesis of composition and band gap tunable InxGa1-xAs alloy nanowires (average diameter = 25-30 nm) by manipulating the source powder mixture ratio and growth parameters. The lattice constants of each NW composition have been well correlated with the chemical stoichiometry and confirmed by high-resolution transmission electron microscopy and X-ray diffraction. Importantly, the as-grown NWs exhibit well-controlled surface morphology and low defect concentration without any phase segregation in all stoichiometric compositions. Moreover, it is found that the electrical nanowire device performances such as the turn-off and I-ON/I-OFF ratios are improved when the In concentration decreases at a cost of mobility degradation. More generally, this work suggests that a careful stoichlometric design is required for achieving optimal nanowire device performances.
引用
收藏
页码:9320 / 9325
页数:6
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