Photonic assisted light trapping integrated in ultrathin crystalline silicon solar cells by nanoimprint lithography

被引:83
作者
Trompoukis, Christos [1 ,2 ]
El Daif, Ounsi [1 ]
Depauw, Valerie [1 ]
Gordon, Ivan [1 ]
Poortmans, Jef [1 ,2 ]
机构
[1] IMEC, B-3001 Louvain, Belgium
[2] Katholieke Univ Leuven, Dept Elektrotech ESAT, B-3001 Louvain, Belgium
关键词
DESIGN; 1D;
D O I
10.1063/1.4749810
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on the fabrication of two-dimensional periodic photonic nanostructures by nanoimprint lithography and dry etching and their integration into a 1-mu m-thin mono-crystalline silicon solar cell. Thanks to the periodic nanopatterning, a better in-coupling and trapping of light is achieved, resulting in an absorption enhancement. The proposed light trapping mechanism can be explained as the superposition of a graded index effect and of the diffraction of light inside the photoactive layer. The absorption enhancement is translated into a 23% increase in short-circuit current, as compared to the benchmark cell, resulting in an increase in energy-conversion efficiency. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4749810]
引用
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页数:4
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