Fabrication of microchannels in glass using focused femtosecond laser radiation and selective chemical etching

被引:288
作者
Hnatovsky, C.
Taylor, R. S.
Simova, E.
Rajeev, P. P.
Rayner, D. M.
Bhardwaj, V. R.
Corkum, P. B.
机构
[1] Natl Res Council Canada, Inst Microstruct Sci, Ottawa, ON K1A 0R6, Canada
[2] Natl Res Council Canada, Steacie Inst Mol Sci, Ottawa, ON K1A 0R6, Canada
[3] Univ Ottawa, Dept Phys, Ottawa, ON K1N 6N5, Canada
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2006年 / 84卷 / 1-2期
关键词
D O I
10.1007/s00339-006-3590-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We use the combination of femtosecond laser dielectric modification and selective chemical etching to fabricate high-quality microchannels in glass. The photoinduced modification morphology has been studied in fused silica and in borosilicate glass BK7, using ultra-high spatial resolution techniques of selective chemical etching followed by atomic force or scanning electron microscopy. The analysis shows that the high differential etch rate inside the modified regions, is determined by the presence of polarization-dependent self-ordered periodic nanocracks or nanoporous structures. We also investigate the optimum irradiation conditions needed to produce high-aspect ratio microchannels with small symmetric cross-sections and smooth walls.
引用
收藏
页码:47 / 61
页数:15
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