Highly defined narrow track write heads fabricated by focused ion beam trimming with the Al2O3 refilling process

被引:5
作者
Ishi, T [1 ]
Nonaka, Y
Matsubara, T
Ishiwata, N
机构
[1] NEC Corp Ltd, Memory Res Lab, Funct Devices Res Lab, Fuchu, Tokyo 1838501, Japan
[2] NEC Corp Ltd, Digital Video File Dev Ctr, Funct Devices Res Lab, Kawasaki, Kanagawa 2160033, Japan
关键词
focused ion beam; pole trimming; narrow track writing;
D O I
10.1109/20.800884
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have developed a focused ion beam trimmed write head using Al2O3 refining, in which an Al2O3 film was deposited and a two-step lapping process was performed after FIB trimming at the air bearing surface. This process provided highly defined pole edges without any rounded corners, well-filled hollows, and a damage-free read element. Good environment-proof characteristics were also obtained, because a diamond-like carbon film was deposited as a protective layer on the element after FIB trimming. The fabricated head showed good overwrite characteristics in half-micron width writing.
引用
收藏
页码:2541 / 2543
页数:3
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