Chemical solution deposited PbS thin films on Si(100)

被引：23

作者：

Osherov, Anna ^{[1
,2
]}

Golan, Yuval ^{[1
,2
]}

机构：

[1] Ben Gurion Univ Negev, Dept Mat Engn, IL-84105 Beer Sheva, Israel

[2] Ben Gurion Univ Negev, Ilse Katz Inst Nanosci & Nanotechnol, IL-84105 Beer Sheva, Israel

来源：

PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 5, NO 11 2008 | 2008年 / 5卷 / 11期

基金：

以色列科学基金会;

关键词：

D O I：

10.1002/pssc.200879445

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The effect of reagent concentrations and deposition temperature on the morphology of chemical solution deposited PbS thin films on Si(100) substrates was studied using X-ray diffraction, scanning electron microscopy and transmission electron microscopy. (c) 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

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页码：3431 / +

页数：2

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