Optimization of the permittivity-based BE SOI biosensor

被引:0
作者
Yojo, L. S. [1 ]
Rangel, R. C. [1 ,2 ]
Sasaki, K. R. A. [1 ]
Martino, J. A. [1 ]
机构
[1] Univ Sao Paulo, LSI PSI USP, Sao Paulo, Brazil
[2] Fac Tecnol Sao Paulo, FATEC SP, Sao Paulo, Brazil
来源
2018 IEEE SOI-3D-SUBTHRESHOLD MICROELECTRONICS TECHNOLOGY UNIFIED CONFERENCE (S3S) | 2018年
基金
巴西圣保罗研究基金会;
关键词
SOI; BE SOI MOSFET; dielectric modulated sensor;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper explores for the first time how the electrical characteristic of the BE (Back Enhanced) SOL MOSFETs (n- and p-type) is affected by the introduction of materials with different permittivities, aiming the biological sensing application. The BE SOL MOSFET is a planar undoped SOI device whose working principle is based on the electrical field interaction between the substrate and the front gate. The biomaterial is deposited on the underlap region between source/drain and gate to be sensed. Simulations of the BE SOL were performed using the experimental data. In the dimensions studied range, the best biosensor sensitivities as a function of the relative permittivity are obtained for the thinnest silicon film (5nm) and shortest underlap length (100nm). Other parameters influence on sensitivities like front and back gate oxide thicknesses and transistor channel dimensions are negligible.
引用
收藏
页数:3
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