Optical emission spectroscopy of lead sulfide films plasma deposition

被引：12

作者：

Mochalov, Leonid ^{[1
,2
]}

Dorosz, Dominik ^{[3
]}

Kochanowicz, Marcin ^{[4
]}

Logunov, Alexander ^{[1
]}

Letnianchik, Aleksey ^{[5
]}

Starostin, Nikolay ^{[5
]}

Zelentsov, Sergey ^{[5
]}

Boreman, Glenn ^{[2
]}

Vorotyntsev, Vladimir ^{[1
]}

机构：

[1] Nizhnii Novgorod State Tech Univ, Nizhnii Novgorod, Russia

[2] Univ North Carolina Charlotte, Charlotte, NC USA

[3] AGH Univ Sci & Technol Krakow, Krakow, Poland

[4] Bialystok Tech Univ, Bialystok, Poland

[5] Lobachevsky Univ, Nizhnii Novgorod, Russia

来源：

SPECTROCHIMICA ACTA PART A-MOLECULAR AND BIOMOLECULAR SPECTROSCOPY | 2020年 / 241卷

基金：

俄罗斯科学基金会;

关键词：

Optical emission spectroscopy; PECVD; Lead sulfide; PBS THIN-FILMS; PARAMETERS; ARRAYS; PBTE;

D O I：

10.1016/j.saa.2020.118629

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

In-situ Optical Emission Spectroscopy (OES) combined with quantum chemical calculations was used as a powerful tool to find out the exited reactive species existing in plasma discharge during the process of lead sulfide chalcogenide materials deposition. Low temperature nonequilibrium RF (40.68 MHz) plasma at low pressure (0.1 Torr) was employed for initiation of chemical interaction between precursors in the gas phase. Only high pure elements were utilized as the initial substances. The ration between starting materials in the gas phase and power included into the plasma discharge were the variables. The mechanism of the plasma-chemical reaction was assumed and discussed. The stoichiometry and morphology of the surface of the as-deposited materials were studied by different analytical techniques. (c) 2020 Elsevier B.V. All rights reserved.

引用

页数：8

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