Influence of the film thickness on texture, residual stresses and cracking behavior of PVD tungsten coatings deposited on a ductile substrate

被引:1
作者
Ganne, T [1 ]
Farges, G [1 ]
Crépin, J [1 ]
Pradeilles-Duval, RM [1 ]
Zaoui, A [1 ]
机构
[1] Ctr Tech, F-94114 Arcueil, France
来源
MECHANICAL PROPERTIES OF STRUCTURAL FILMS | 2001年 / 1413卷
关键词
magnetron sputtering; residual stresses; crystallographic texture; cracking behavior; tungsten coating;
D O I
10.1520/STP10984S
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Tungsten coatings are deposited on a steel substrate by magnetron sputtering. For coatings deposited under identical processing conditions, a (111) texture develops, with the increase of the coating thickness mid the decrease of the residual stress. No gradient stress has been observed in the diffracted volume and the residual stress state is isotropic and plane. Tensile and four-point bending tests are performed in a SEM chamber in order to study the cracking kinetics. Taking account of die residual stresses, an intrinsic cracking stress can be determined. Cracking kinetics are found to depend on the coating thickness and the substrate yield stress. No debonding was observed at the interface despite the large plastic deformation of the substrate at the crack tips. This corresponding strain localization has a strong influence on the crack density and the cracking kinetics.
引用
收藏
页码:96 / 108
页数:13
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