Superhardness effect of TaN/TiN and NbN/TiN nanostructure multilayers and its mechanism

被引：7
作者：
Yu Li-Hua [1 ]
Dong Shi-Run [1 ]
Xu Jun-Hua [1 ]
Li Ge-Yang [2 ]
机构：
[1] Jiangsu Univ Sci & Technol, Sch Mat Sci & Engn, Key Lab Adv Welding Technol Jiangsu Prov, Zhenjiang 212003, Peoples R China
[2] Shanghai Jiao Tong Univ, Stay Key Lab Met Metrix Composit, Shanghai 200030, Peoples R China
来源：
ACTA PHYSICA SINICA | 2008年 / 57卷 / 11期
基金：
中国国家自然科学基金;
关键词：
TaN/TiN nanomultilayers; NbN/TiN nanomultilayers; epitaxial growth; superhardness effect;
D O I：
10.7498/aps.57.7063
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
Monolithic TaN,NbN, TiN films and TaN/TiN, NbN/TiN multilayers with different modulation periods were prepared by reactive magnetic sputtering. The films were characterized by X-ray diffraction, high-resolution transmission electron microscopy and nanoindentation. Results showed that there are coherent interfaces between the layers of TaN and TiN in TaN/TiN multilayers and the layers of NbN and TiN in NbN/TiN multilayers within a modulation period. The superhardness effect happened and the maximum hardness values of the two multilayers are nearly equal. The superhardness mechanism was discussed. The lattices mismatch between NbN/TiN and TaN/TiN multilayers is similar, but the difference in modulus of NbN/TiN multilayers is larger than that of TaN/TiN multilayers. It shows that stress field induced by coherent epitaxial growth is the main reason of superhardness effect.
引用
收藏
页码：7063 / 7068
页数：6
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