Study on Repetitive PID Control of Linear Motor in Wafer Stage of Lithography

被引：8

作者：

Hou, Bo-jie ^{[1
]}

Gao, Jian-she ^{[1
]}

Li, Xiao-qing

Zhou, Yun-fei

机构：

[1] Zhengzhou Univ, Sch Mech Engn, Zhengzhou 450001, Peoples R China

来源：

2012 INTERNATIONAL WORKSHOP ON INFORMATION AND ELECTRONICS ENGINEERING | 2012年 / 29卷

关键词：

repetitive control; lithography; wafer stage; linear motor; PID control; SERVO SYSTEM; DESIGN;

D O I：

10.1016/j.proeng.2012.01.585

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

A 'Repetitive + PID + feedforward' control mode is proposed to improve the trajectory-tracking performance of linear motors in wafer stage of lithography. The positioning error of linear motor is decreased greatly compared to PID control and 'PID + feedforward' control. The contradiction of high speed and high positioning accuracy has been solved. The results of MATLAB simulation and experiments demonstrated the effectiveness of the proposed methods. (C) 2011 Published by Elsevier Ltd. Selection and/or peer-review under responsibility of Harbin University of Science and Technology

引用

页码：3863 / 3867

页数：5

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