901 nm Lithographic vertical-cavity surface-emitting laser with stable single-lobed beam pattern

被引：0
|
作者：
Li, M. [1 ]
Yang, X. [1 ]
Zhang, Y. [1 ]
Zhao, G. [2 ]
Beadsworth, J. [2 ]
Eifert, L. [3 ]
Tucker, F. [3 ]
Deppe, D. G. [1 ,2 ]
机构：
[1] Univ Cent Florida, Coll Opt & Photon, CREOL, Orlando, FL 32816 USA
[2] SdPhoton LLC, Orlando, FL 32816 USA
[3] Army Res Lab, Orlando, FL 32826 USA
来源：
ELECTRONICS LETTERS | 2015年 / 51卷 / 21期
关键词：
Efficiency; -; Transceivers;
D O I：
10.1049/el.2015.3003
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Data are presented on 901 nm lithographic vertical-cavity surface-emitting lasers (VCSELs) demonstrating high efficiency for small VCSEL sizes, and stable beam patterns. Power conversion efficiency >40% is obtained for VCSELs ranging in size from 6 to 2 mu m diameter. The 2 mu m diameter VCSELs produce output powers in excess of 6.5 mW, and produce single-lobed far-field radiation patterns over the full range of operation.
引用
收藏
页码：1683 / U104
页数：2
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