Coherent anti-Stokes Raman scattering performed on expanding thermal arc plasmas

被引:38
作者
Meulenbroeks, RFG
Engeln, RAH
vanderMullen, JAM
Schram, DC
机构
[1] Eindhoven University of Technology, Department of Physics, MB Eindhoven, 5600
来源
PHYSICAL REVIEW E | 1996年 / 53卷 / 05期
关键词
D O I
10.1103/PhysRevE.53.5207
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The expanding plasma emanating from a thermal are plasma source that can be used for deposition of thin films is studied using laser spectroscopic techniques. The argon-hydrogen plasma is characterized by very fast recombination that cannot be explained by atomic processes. To explore this phenomenon, which has been related to wall association of hydrogen atoms and recirculation, CARS (coherent anti-Stokes Raman scattering) is performed on (argon-)hydrogen plasmas. The periphery of the plasma appears to be rich in hydrogen molecules, in accordance with the recirculation model. No highly rovibrationally excited states are detected in the periphery, in spite of the spectrometer's very good sensitivity (0.1 Pa H-2 at 300 K). For the plasma, rotational and vibrational temperatures as well as absolute H, densities are measured. A simple model for the observed (non-Boltzmann) rotational populations is developed.
引用
收藏
页码:5207 / 5217
页数:11
相关论文
共 28 条
[1]   PRESSURE AND ELECTRON-TEMPERATURE DEPENDENCE OF H- DENSITY IN A HYDROGEN PLASMA [J].
BACAL, M ;
BRUNETEAU, AM ;
GRAHAM, WG ;
HAMILTON, GW ;
NACHMAN, M .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (03) :1247-1254
[2]   FAST DEPOSITION OF AMORPHOUS-CARBON AND SILICON LAYERS [J].
BUURON, AJM ;
MEEUSEN, GJ ;
BEULENS, JJ ;
VANDESANDEN, MCM ;
SCHRAM, DC .
JOURNAL OF NUCLEAR MATERIALS, 1993, 200 (03) :430-433
[3]   TEMPERATURE AND CONCENTRATION DISTRIBUTION OF H2 AND H-ATOMS IN HOT-FILAMENT CHEMICAL-VAPOR DEPOSITION OF DIAMOND [J].
CHEN, KH ;
CHUANG, MC ;
PENNEY, CM ;
BANHOLZER, WF .
JOURNAL OF APPLIED PHYSICS, 1992, 71 (03) :1485-1493
[4]   ANOMALOUS FAST RECOMBINATION IN HYDROGEN PLASMAS INVOLVING ROVIBRATIONAL EXCITATION [J].
DEGRAAF, MJ ;
SEVERENS, R ;
DAHIYA, RP ;
VANDESANDEN, MCM ;
SCHRAM, DC .
PHYSICAL REVIEW E, 1993, 48 (03) :2098-2102
[5]  
DEGRAAF MJ, 1992, J HIGH TEMP CHEM PRO, V3, P11
[6]  
DEPRISTO AE, 1979, J CHEM PHYS, V71, P580
[7]  
DEROUARD J, 1988, CHEM PHYS, V88, P171
[8]   CARS SPECTROSCOPY [J].
DRUET, SAJ ;
TARAN, JPE .
PROGRESS IN QUANTUM ELECTRONICS, 1981, 7 (01) :1-72
[9]   NONEQUILIBRIUM ELECTRONIC AND VIBRATIONAL KINETICS IN H-2-N-2 AND H-2 DISCHARGES [J].
GARSCADDEN, A ;
NAGPAL, R .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1995, 4 (02) :268-280
[10]   ROTATIONAL EXCITATION IN H2-H2 COLLISIONS - CLOSE-COUPLING CALCULATIONS [J].
GREEN, S .
JOURNAL OF CHEMICAL PHYSICS, 1975, 62 (06) :2271-2277