A study of photoreactions in photosensitive TiO2 hybrid gel films induced by UV irradiation

被引：5

作者：

Segawa, Hiroyo ^{[1
]}

Inoue, Satoru ^{[1
]}

Watanabe, Kenji ^{[1
]}

Ohashi, Ryutaro ^{[2
]}

Nitani, Hiroaki ^{[3
]}

Nomura, Masaharu ^{[3
]}

机构：

[1] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan

[2] Kanazawa Univ, Kanazawa, Ishikawa 9201192, Japan

[3] High Energy Accelerat Res Org, Tsukuba, Ibaraki 3050801, Japan

来源：

JOURNAL OF THE CERAMIC SOCIETY OF JAPAN | 2015年 / 123卷 / 1441期

关键词：

Chelate ring; XAFS; NMR; Structural change; Sol-gel; DIFFRACTION GRATINGS; CHEMICAL-MODIFICATION; FREEFORM FABRICATION; THIN-FILMS; STEREOLITHOGRAPHY; ABSORPTION; QUICK;

D O I：

10.2109/jcersj2.123.793

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Photosensitive TiO2 gel films containing beta-diketones and monomers with unsaturated hydrocarbons exhibit photosensitivity and can be patterned by photolithography. Photosensitive TiO2 gel films containing dibenzoylmethane (DBM) and methacrylic acid (MA) were prepared by the sol-gel method. The photoreactions of the gel films under ultraviolet (UV) light were investigated by UV-Vis, infrared, Raman, nuclear magnetic resonance, and X-ray absorption fine structure spectroscopic measurements. UV irradiation causes the chelate rings between titanium alkoxide and DBM or MA to decompose without drastic changes in the coordination number of Ti and in Ti-O distances, and it causes the formation of Ti-O-Ti networks. MA is photopolymerized by radicals resulting from the decomposition of DBM. These structural changes induced by UV irradiation cause the alcohol solubility of the materials to differ, and they allow fine patterns to be formed by etching. (C) 2015 The Ceramic Society of Japan. All rights reserved.

引用

页码：793 / 799

页数：7

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