Linear avalanche photodetector based on CMOS process

被引:0
作者
Ju Guohao [1 ,2 ,3 ]
Cheng Zhengxi [1 ]
Chen Yongping [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Tech Phys, Key Lab Infrared Imaging Mat & Detectors, Shanghai 200083, Peoples R China
[2] Shanghai T ech Univ, Shanghai 201210, Peoples R China
[3] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
来源
FIFTH SYMPOSIUM ON NOVEL OPTOELECTRONIC DETECTION TECHNOLOGY AND APPLICATION | 2019年 / 11023卷
关键词
CMOS process; linear avalanche photodetector; excess noise factor; visible light detection; DARK CURRENT;
D O I
10.1117/12.2521364
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A linear avalanche photodetector based on standard CMOS process is designed and fabricated. The doping dose of p-layer of the device with typical n(+) p-pi-p(+) epitaxial structure is 1.82 x 10(12)/cm(2), and the depth of the doping peak concentration is 2.1 mu m. The dark current, photocurrent, spectral response and excess noise factor are measured. The punch-through voltage is about 60 V, the breakdown voltage is about 147 V. The spectral response range is 400 similar to 100 nm, and the peak response wavelength is about 850 nm, the peak response wavelength is in the near-infrared range. When the gain is 50, the reverse bias voltage is about 143.3 V, and excess noise factor is about 4.35. The results show that the device has an excellent performance of visible light detection.
引用
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页数:5
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