Physics of GaN-based heterostructure field effect transistors

被引:0
|
作者
Shur, MS [1 ]
Gaska, R [1 ]
机构
[1] Rensselaer Polytech Inst, ECSE Dept, Troy, NY 12180 USA
来源
2005 IEEE CSIC SYMPOSIUM, TECHNICAL DIGEST | 2005年
关键词
GaN; FETs; 2D electrons;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
GaN-based field effect transistors might replace other compound semiconductor FETs in microwave and, possibly, even in millimeter and submillimeter wave applications. New device physics of these devices (primarily linked to their wurtzite symmetry and to small nitrogen mass) has to be understood to facilitate this process. In this paper, we review the new physics of polarization, electron transport, and gate leakage, and current collapse in these devices.
引用
收藏
页码:137 / 140
页数:4
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