Characterization of the adhesion of SU-8 and Epoclad

被引:1
作者
Wouters, Kristof [1 ]
Puers, Robert [1 ]
机构
[1] Katholieke Univ Leuven, Dept Elektrotech ESAT MICAS, B-3001 Louvain, Belgium
关键词
MEMS;
D O I
10.1088/0960-1317/22/9/097002
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, the adhesion of SU-8 and Epoclad polymers to silicon substrates is quantified as an energy release rate, and the effect of a chromium coating as an adhesion promoter is studied. The intention is to quantify the adhesion strength for processing parameters that were previously optimized to yield good adhesion for various patterns and layer thicknesses. To do so, a custom tool is built to measure the force to shear off a square button of the epoxy from the substrate. Silicon and the silicon wafers coated with chromium were used as a substrate. Fracture mechanics is used to model this test and an energy release rate for different combinations of epoxies and substrates is determined. The energy release rates between SU-8 and Si and between SU-8 and Cr are measured to be 1.7 x 10(2) +/- 0.3 x 10(2) J m(-2) and 2.6 x 10(2) +/- 0.5 x 10(2) J m(-2), respectively. The energy release rates between Epoclad and Si and between Epoclad and Cr were determined to be 2.8 x 10(2) +/- 0.4 x 10(2) J m(-2) and 35 +/- 6 J m(-2), respectively.
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页数:7
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