Electrochemical deposition of lead and tellurium into barrierless nanoporous anodic aluminium oxide

被引：15

作者：

Ivanou, D. K. ^{[1
]}

Ivanova, Yu. A. ^{[1
]}

Lisenkov, A. D. ^{[1
]}

Zheludkevich, M. L. ^{[1
]}

Streltsov, E. A. ^{[2
]}

机构：

[1] Univ Aveiro, DECV CICECO, P-3810193 Aveiro, Portugal

[2] Belarusian State Univ, Minsk 220050, BELARUS

来源：

ELECTROCHIMICA ACTA | 2012年 / 77卷

关键词：

Alumina; Tellurium; Electrodeposition; Lead; Underpotential deposition; HIGH-ASPECT-RATIO; NANOWIRE ARRAYS; ELECTRODEPOSITION; FABRICATION; DISSOLUTION; SUBSTRATE; GROWTH; TE;

D O I：

10.1016/j.electacta.2012.05.061

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Electrochemical deposition of Pb and Te into barrierless nanoporous aluminium oxide films on Ti substrates was studied. Porous anodic alumina on Ti was prepared by two-step anodization in oxalic acid of Al layer sputtered on Ti. The barrier layer was eliminated by the controllable acidic treatment of anodized samples. The effectiveness of the barrier layer dissolution was studied electrochemically using lead deposition-oxidation test reaction. Electrodeposition of Te into porous anodic alumina films was found to proceed with overvoltage related both to nucleation barrier and diffusion limitation in the pores. Lead underpotential deposition on Te particles electrodeposited in anodic alumina films was considered. It is characterized by high irreversibility due to the effective chemical interaction between Te nanoparticles and lead adatoms resulting in PbTe nanoparticles formation. Crown Copyright (C) 2012 Published by Elsevier Ltd. All rights reserved.

引用

页码：65 / 70

页数：6

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