CMOS Junctionless Field-Effect Transistors Manufacturing Cost Evaluation

被引:13
作者
Wen, Sandy M. [1 ]
Chui, Chi On [1 ]
机构
[1] Univ Calif Los Angeles, Dept Elect Engn, Los Angeles, CA 90095 USA
关键词
Fin field-effect transistor (FinFET); junctionless; manufacturability; semiconductor processing;
D O I
10.1109/TSM.2012.2225648
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Junctionless field-effect transistors (JL-FETs) contain no doping gradients, so they are thought to be simpler to process and less costly to manufacture than fin field-effect transistors (FinFETs). To check this assertion, process flows for CMOS JL-FETs on 300mm SOI and bulk silicon substrates with 22nm gate length are developed, and the manufacturing costs are calculated using a cost-of-ownership based approach. It has been determined that for a given substrate, the cost of the given JL-FET process flows is comparable with FinFET processing with less than 2% cost difference, while JL-FET processing on SOI costs are greater than 10% on bulk silicon. The largest component of process cost is due to photolithography.
引用
收藏
页码:162 / 168
页数:7
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