Extra-Low Temperature Growth of ZnO Thin Films by Atomic Layer Deposition

被引:4
|
作者
Guziewicz, E. [1 ]
Godlewski, M. [1 ,2 ]
Kopalko, K. [1 ]
Kowalik, I. A. [1 ]
Yatsunenko, S. [1 ]
Osinnyi, V. [1 ]
Paszkowicz, W. [1 ]
Lusakowska, E. [1 ]
Dluzewski, P. [1 ]
机构
[1] Polish Acad Sci, Inst Phys, Warsaw, Poland
[2] Cardinal S Wyszynski Univ, Coll Sci, Dept Math & Nat Sci, Warsaw, Poland
关键词
Low-temperature growth; Zinc oxide; Atomic layer deposition; Optical properties;
D O I
10.3938/jkps.53.2880
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We report on ZnO thin films grown by the atomic layer deposition method at temperature of 200 degrees C and below. Low-temperature ZnO layers show bright excitonic photoluminescence for "as-grown" samples. Defect-related bands usually observed in the green and the red regions are of low intensity and are absent for ZnO layers grown at 140 degrees C - 200 degrees C, which is evidence that competing radiative decay channels are ineffective. We relate this to a blocking of the vacancy formation, which is thermally suppressed at low growth temperature. Hall measurements show that the free-carrier concentration strongly depends on the growth temperature and has the lowest value of 2 . 10(17)/cm(3) for films grown at 100 degrees C and below.
引用
收藏
页码:2880 / 2883
页数:4
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