Molecular dynamics study on dynamic response of void-included aluminum under different loading patterns

被引:25
作者
Guan, Yun-Long [1 ]
Shao, Jian-Li [1 ]
Song, Wei-Dong [1 ]
机构
[1] Beijing Inst Technol, State Key Lab Explos Sci & Technol, Beijing 100081, Peoples R China
基金
中国国家自然科学基金; 中国博士后科学基金;
关键词
Constant strain rate; Constant-stress hugoniostat; Direct shock; Molecular dynamics; Void collapse; NANOVOID GROWTH; PLASTIC-DEFORMATION; SINGLE-CRYSTAL; ORIENTATION; SIMULATIONS; METALS;
D O I
10.1016/j.ijmecsci.2020.105707
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
Molecular dynamics method is used to investigate the dynamic response of void-included aluminum under three loading patterns, which are constant strain rate, constant-stress Hugoniostat and direct shock loadings. The simulations show a very weak dependence of the dynamic response on the loading patterns under weak loadings, where appears a similar dislocation distribution originated from the initial void. When the pressure exceeds 13.3 GPa, the homogeneous dislocations will appear for the direct shock loading, whose growth can lead to intersections and then hinders the relaxation of the shear stress to some extent. Besides, we also observe the transformation from FCC to HCP when the loading pressure exceeds 33.5 GPa, whose effect on the shear stress is very significant. For the other two loadings, the dislocations still firstly originate from the void and then grow into symmetrical dislocation bands along the {111} planes, whose effect on the shear stress is not significant. Finally, we provide the adjusted parameter (damping coefficient of stress) for the constant-stress Hugoniostat method with a wide range of shock pressure, which can agree with the results from the direct shock for the void-included sample. These results are important reference for the application of the constant-stress Hugoniostat method in defective metals.
引用
收藏
页数:10
相关论文
共 52 条
  • [1] PROPOSED EXPERIMENTAL PROBES OF CHEMICAL-REACTION MOLECULAR-DYNAMICS IN SOLUTION - ICN PHOTODISSOCIATION
    BENJAMIN, I
    WILSON, KR
    [J]. JOURNAL OF CHEMICAL PHYSICS, 1989, 90 (08) : 4176 - 4197
  • [2] Bernard S, 2002, PHYS REV B, V66
  • [3] Investigating Damage Evolution at the Nanoscale: Molecular Dynamics Simulations of Nanovoid Growth in Single-Crystal Aluminum
    Bhatia, M. A.
    Solanki, K. N.
    Moitra, A.
    Tschopp, M. A.
    [J]. METALLURGICAL AND MATERIALS TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE, 2013, 44A (02): : 617 - 626
  • [4] Molecular dynamics simulations of shock waves using the absorbing boundary condition: A case study of methane
    Bolesta, Alexey V.
    Zheng, Lianqing
    Thompson, Donald L.
    Sewell, Thomas D.
    [J]. PHYSICAL REVIEW B, 2007, 76 (22)
  • [5] Void initiation in fcc metals: Effect of loading orientation and nanocrystalline effects
    Bringa, Eduardo M.
    Traiviratana, Sirirat
    Meyers, Marc A.
    [J]. ACTA MATERIALIA, 2010, 58 (13) : 4458 - 4477
  • [6] Minimizing boundary reflections in coupled-domain simulations
    Cai, W
    de Koning, M
    Bulatov, VV
    Yip, S
    [J]. PHYSICAL REVIEW LETTERS, 2000, 85 (15) : 3213 - 3216
  • [7] Molecular dynamics modeling and simulation of void growth in two dimensions
    Chang, H-J
    Segurado, J.
    Rodriguez de la Fuente, O.
    Pabon, B. M.
    Lorca, J. L.
    [J]. MODELLING AND SIMULATION IN MATERIALS SCIENCE AND ENGINEERING, 2013, 21 (07)
  • [8] Cotterill RMJ, 1974, PHILOS MAG, V30, P19
  • [9] Atomistic modeling of shock-induced void collapse in copper -: art. no. 161902
    Dávila, LP
    Erhart, P
    Bringa, EM
    Meyers, MA
    Lubarda, VA
    Schneider, MS
    Becker, R
    Kumar, M
    [J]. APPLIED PHYSICS LETTERS, 2005, 86 (16) : 1 - 3
  • [10] Guan Y.L, COMPUT MAT SCI