Fabrication of Micro-Pillar Array on Silicon Surface by Femtosecond Laser Direct Writing Mask

被引：2

作者：

Tian Yaxiang ^{[1
]}

Fan, Zhang ^{[1
]}

Ding Kaiwen ^{[1
]}

Shu, Man ^{[1
]}

Wu Biwei ^{[1
]}

机构：

[1] Cent South Univ, Coll Mech & Elect Engn, State Key Lab High Performance & Complex Mfg, Changsha 410083, Hunan, Peoples R China

来源：

LASER & OPTOELECTRONICS PROGRESS | 2019年 / 56卷 / 18期

关键词：

ultrafast optics; thermal oxidation effect; silicon; micro-pillar array; potassium hydroxide; mask;

D O I：

10.3788/LOP56.183201

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A method of fabricating micro-pillar array based on femtosecond laser direct writing mask is presented. Using the thermal oxidation effect of a high-repetition-rate femtosecond laser, the silicon dioxide dot array is formed on the silicon surface. The micro-pillar array is obtained by etching with potassium hydroxide. Compared with the traditional lithography, the proposed method is simple and low-cost. In addition, the influences of laser power, exposure time, and hydrofluoric acide etching on the mask size arc investigated. This kind of micro-pillar array has good application value in reflection reducing and sensing.

引用

页数：6

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