An Anomalous Formation Pathway for Dislocation-Sulfur Vacancy Complexes in Polycrystalline Monolayer MoS2

被引:101
|
作者
Yu, Zhi Gen [1 ]
Zhang, Yong-Wei [1 ]
Yakobson, Boris I. [2 ]
机构
[1] Inst High Performance Comp, Singapore 138632, Singapore
[2] Rice Univ, Dept Mech Engn & Mat Sci, Houston, TX 77005 USA
关键词
MoS2; grain boundary; S vacancy; first-principles calculations; MOLYBDENUM-DISULFIDE; GRAIN-BOUNDARIES; DEFECTS; TRANSISTORS; TRANSPORT; DIODES; STATES; LAYERS;
D O I
10.1021/acs.nanolett.5b02769
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Two-dimensional (2D) molybdenum disulfide (MoS2) has attracted significant attention recently due to its direct bandgap semiconducting characteristics. Experimental studies on monolayer MoS2 show that S vacancy concentration varies greatly; while recent theoretical studies show that the formation energy of S vacancy is high and thus its concentration should be low. We perform density functional theory calculations to study the structures and energetics of vacancy and interstitial in both grain boundary (GB) and grain interior (GI) in monolayer MoS2 and uncover an anomalous formation pathway for dislocation-double S vacancy (V-2S) complexes in MoS2. In this pathway, a (5 vertical bar 7) defect in an S-polar GB energetically favorably converts to a (4 vertical bar 6) defect, which possesses a duality: dislocation and double S vacancy. Its dislocation character allows it to glide into GI through thermal activation at high temperatures, bringing the double vacancy with it. Our findings here not only explain why Vs is predominant in exfoliated 2D MoS2 and V-2S is predominant in chemical vapor deposition (CVD-grown 2D MoS2 but also reproduce GB patterns in CVD-grown MoS2. The new pathway for sulfur vacancy formation revealed here provides important insights and guidelines for controlling the quality of monolayer MoS2.
引用
收藏
页码:6855 / 6861
页数:7
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