Synthesis and characterization of nano-composite Ti-Si-N hard coating by filtered cathodic arc deposition

被引:15
作者
Chang, Chi-Lung [1 ]
Chen, Jun-Han [2 ]
Tsai, Pi-Chuen [2 ,3 ]
Ho, Wei-Yu [1 ]
Wang, Da-Yung [4 ]
机构
[1] MingDao Univ, Dept Mat Sci & Engn, Changhua 523, Taiwan
[2] Natl Formosa Univ, Grad Inst Mat Sci & Green Energy Engn, Huwei, Yunlin, Taiwan
[3] Natl Formosa Univ, Dept Mat Sci & Engn, Huwei, Yunlin, Taiwan
[4] MingDao Univ, Inst Mat & Syst Engn, Changhua 523, Taiwan
关键词
Ti-Si-N film; Filtered cathodic arc deposition; Roughness; Corrosion resistance;
D O I
10.1016/j.surfcoat.2008.04.096
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Nano-composite Ti-Si-N films were deposited on tungsten carbide substrates by a filtered cathodic arc deposition system using TiSi-alloy as arc Sources. The influences of bias voltages on the microstructure, mechanical and corrosion properties of the films were investigated. Field emission scanning electron microscope, atomic force rnicroscopy, X-ray diffractometer, X-ray photoelectron spectroscopy, high-resolution electron probe microanalyzer, polarization and immersion tests were employed to identify microstructures and properties of Ti-Si-N films. Both magnetic 90 degrees-filter duct arc source and substrate bias voltage have important effects on the surface roughness, microstructure and corrosion properties of Ti-Si-N coatings. The results showed that both the increase of Si content and decrease of grain size resulted from the increase of substrate bias voltage. The microhardness of the coatings was enhanced by increasing substrate bias voltage. The corrosion resistance of coatings tested in 1 N H2SO4 solution confirmed that Ti-Si-N coatings with a magnetic 90 degrees-filter duct arc Source were better than Ti-Si-N coatings without a magnetic 90 degrees-filter duct arc source due to the effect of reducing microparticles. On the other hand, the corrosion resistance is also increased with reducing surface roughness of Ti-Si-N films, which can be controlled by substrate bias voltage in deposition process. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:619 / 623
页数:5
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