The effect of ion energy on the surface morphology of platinum film under high-frequency ion plasma sputtering

被引：1

作者：

Amirov, I. I. ^{[1
]}

Naumov, V. V. ^{[1
]}

Izyumov, M. O. ^{[1
]}

Selyukov, R. S. ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Phys & Technol, Yaroslavl Branch, Yaroslavl 150007, Russia

来源：

TECHNICAL PHYSICS LETTERS | 2013年 / 39卷 / 01期

关键词：

Scanning Tunneling Microscopy; Technical Physic Letter; PbTe; PbSe; Scanning Tunneling Microscopy Image;

D O I：

10.1134/S1063785013010306

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The effect of ion energy (E (i) = 45-220 eV) on the sputter deposition rate and surface morphology of polycrystalline platinum films processed in high-density argon plasma of low-pressure (P = 0.08 Pa) RF induction discharge has been studied. The sputtering yield of Pt has been determined as a function of the ion energy. Analysis of the data of scanning tunneling microscopy showed a large difference between the surface profiles of samples treated at minimum and maximum ion energies in the range studied. The mechanism of Pt surface morphology modification by ion plasma sputtering is discussed. DOI:10.1134/S1063785013010306

引用

页码：130 / 133

页数：4

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