Measurement of Neutral Gas Temperature in a 13.56 MHz Inductively Coupled Plasma

被引:5
作者
Jayapalan, Kanesh K. [1 ]
Chin, Oi Hoong [1 ]
机构
[1] Univ Malaya, Dept Phys, Plasma Technol Res Ctr, Kuala Lumpur 50603, Malaysia
来源
NATIONAL PHYSICS CONFERENCE 2014 (PERFIK 2014) | 2015年 / 1657卷
关键词
actinometry optical emission spectroscopy; inductively coupled plasma; neutral gas temperature;
D O I
10.1063/1.4915242
中图分类号
O59 [应用物理学];
学科分类号
摘要
Measuring the temperature of neutrals in inductively coupled plasmas (ICP) is important as heating of neutral particles will influence plasma characteristics such as the spatial distributions of plasma density and electron temperature. Neutral gas temperatures were deduced using a non-invasive technique that combines gas actinometry, optical emission spectroscopy and simulation which is described here. Argon gas temperature in a 13.56 MHz ICP were found to fall within the range of 500 - 800 K for input power of 140 - 200 W and pressure of 0.05 - 0.2 mbar. Comparing spectrometers with 0.2 nm and 0.5 nm resolution, improved fitting sensitivity was observed for the 0.2 nm resolution.
引用
收藏
页数:6
相关论文
共 10 条
  • [1] DAVIS GP, 1983, J APPL PHYS, V54, P3080, DOI 10.1063/1.332514
  • [2] Diagnostics of inductively coupled chlorine plasmas: Measurements of the neutral gas temperature
    Donnelly, VM
    Malyshev, MV
    [J]. APPLIED PHYSICS LETTERS, 2000, 77 (16) : 2467 - 2469
  • [3] Herzberg G., 1966, Molecular Spectra and Molecular Structure III: Electronic Spectra and Electronic Structure of Polyatomic Molecules
  • [4] Huber K.P., 1979, Molecular Spectra and Molecular Structure. IV. Constants of Diatomic Molecules, P412
  • [5] Effect of neutral gas heating on the wave magnetic fields of a low pressure 13.56 MHz planar coil inductively coupled argon discharge
    Jayapalan, Kanesh K.
    Chin, Oi-Hoong
    [J]. PHYSICS OF PLASMAS, 2014, 21 (04)
  • [6] The effects of neutral gas heating on H mode transition and maintenance currents in a 13.56 MHz planar coil inductively coupled plasma reactor
    Jayapalan, Kanesh K.
    Chin, Oi-Hoong
    [J]. PHYSICS OF PLASMAS, 2012, 19 (09)
  • [7] Measurement of neutral gas temperature in inductively coupled plasmas
    Li, H.
    Xiao, C.
    Zhang, E.
    Singh, A. K.
    Hirose, A.
    [J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS, 2011, 166 (06): : 399 - 407
  • [8] Shimada M., 2006, THESIS U CALIFORNIA
  • [9] Neutral gas temperatures measured within a high-density, inductively coupled plasma abatement device
    Tonnis, EJ
    Graves, DB
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2002, 20 (05): : 1787 - 1795
  • [10] ATOMIC CHLORINE CONCENTRATION AND GAS TEMPERATURE-MEASUREMENTS IN A PLASMA-ETCHING REACTOR
    WORMHOUDT, J
    STANTON, AC
    RICHARDS, AD
    SAWIN, HH
    [J]. JOURNAL OF APPLIED PHYSICS, 1987, 61 (01) : 142 - 148