Losses in multilevel crossover in VLSI interconnects

被引：1

作者：

Datta, PK ^{[1
]}

Sanyal, S ^{[1
]}

Bhattacharya, D ^{[1
]}

机构：

[1] Indian Inst Technol, Dept Elect & Elect Commun Engn, Kharagpur 721302, W Bengal, India

来源：

ASP-DAC/VLSI DESIGN 2002: 7TH ASIA AND SOUTH PACIFIC DESIGN AUTOMATION CONFERENCE AND 15TH INTERNATIONAL CONFERENCE ON VLSI DESIGN, PROCEEDINGS | 2002年

关键词：

D O I：

10.1109/ASPDAC.2002.994905

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

The radiation and surface wave losses may give rise to electromagnetic interference (EMI) problems in high speed VLSI interconnects. Over and above there will be dielectric and conductor losses. These losses have been evaluated for multilevel interconnects by finite difference time domain (FDTD) technique. The crosstalk between lines in the same level as well as in different levels and propagation delays are also found.

引用

页码：142 / 146

页数：5