Growth of ZnO thin films by metalorganic chemical vapor deposition using isopropyl alcohol for oxygen precursor

被引:1
作者
Park, Jae Young [1 ]
Hong, Yong Sung [1 ]
Kim, Sang Sub [1 ]
机构
[1] Chonnam Natl Univ, Dept Mat Sci & Engn, Kwangju 500757, South Korea
来源
ECO-MATERIALS PROCESSING & DESIGN VII | 2006年 / 510-511卷
关键词
ZnO thin films; MOCVD; morphology; alcohol precursor;
D O I
10.4028/www.scientific.net/MSF.510-511.998
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
ZnO thin films were synthesized by metalorganic chemical vapor deposition on Al2O3 (0001) substrates particularly using isopropyl alcohol for oxygen precursor. Change in microstructure was investigated depending on the growth temperature and the O/Zn precursor ratio. Under an optimized condition, ZnO thin films having a very smooth surface and dense cross-sectional microstructure were obtained while possessing epitaxial crystalline alignment. However, the photoluminescent spectrum lacks the band-edge emission.
引用
收藏
页码:998 / 1001
页数:4
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