Preparation and characterization of α-Fe2O3 nanorod-thin film by metal-organic chemical vapor deposition

被引：53

作者：

Cha, Hyun Gil ^{[1
]}

Kim, Chang Woo ^{[1
]}

Kim, Young Hwan ^{[2
]}

Jung, Mi Hyang ^{[2
]}

Ji, Eun Sun ^{[1
]}

Das, Bijoy K. ^{[2
]}

Kim, Ju Chang ^{[2
]}

Kang, Young Soo ^{[1
]}

机构：

[1] Sogang Univ, Dept Chem, Seoul 121742, South Korea

[2] Pukyong Natl Univ, Dept Chem, Pusan 608737, South Korea

来源：

THIN SOLID FILMS | 2009年 / 517卷 / 05期

关键词：

Vertical reactor; Metal-organic chemical vapor deposition; alpha-Fe2O3; nanorods; Rhombohedral structure; Photo-degradation; Rhodamine B; CONTROLLED GROWTH; NANOTUBES; HETEROSTRUCTURES; ARRAYS;

D O I：

10.1016/j.tsf.2008.10.023

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Alpha iron oxide (alpha-Fe2O3) films were grown on catalyst-free silicon substrate using a vertical type metalorganic chemical vapor deposition process. X-ray powder diffraction and field-emission transmission electron microscopy measurements showed that these alpha-Fe2O3 films consisted of bundles of one dimensional (1D) nanorods and the nanorods in these alpha-Fe2O3 films were single crystalline with a well-ordered rhombohedral structure. The nanorods showed a preferred growth orientation in the [104] direction. Magnetic force microscopy image suggests that spin domains were formed in the alpha-Fe2O3 nanorods. Photo-catalytic property of these nanorod films was confirmed through the photo-degradation of Rhodamine B by UV irradiation. These alpha-Fe2O3 film/nanorod materials could be used as building blocks for nanodevice applications. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：1853 / 1856

页数：4

共 19 条

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