Femtosecond-pulse visible laser processing of transparent materials

被引:118
|
作者
Kruger, J [1 ]
Kautek, W [1 ]
机构
[1] FED INST MAT RES & TESTING,LAB LASER & CHEM THIN FILM TECHNOL,D-12200 BERLIN,GERMANY
关键词
D O I
10.1016/0169-4332(95)00446-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
High-power lasers in industrial and R&D applications raise the general problem of reliability and degradation of optical components. A systematic study of nonlinear interaction of various transparent dielectric materials as e.g. glasses, fused silica, and polymers, with laser-pulses in the intensity range of up to 10(13) W cm(-2) is presented. On the other hand, femtosecond-pulse laser processing in the visible spectral range (300 fs; 620 nm, similar to 2 eV) allows precise microstructuring of transparent dielectrics without disruption of the remnant material. Damage and ablation threshold fluences occur above 1.2 J cm(-2) at both silicate glasses and fused silica. Two different photon absorption mechanisms have been observed. The first occurs during the initial laser pulses in the incubation range. There, multiphoton absorption results in moderate energy volume densities. These are sufficient to generate morphological changes and optically active defect sites (colour centres) which provide a much higher absorptivity relevant fur the second mechanism. It results in gasification without participation of melt.
引用
收藏
页码:430 / 438
页数:9
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