Mechanical and electronic properties of monolayer MoS2 under elastic strain

被引:324
作者
Yue, Qu [2 ]
Kang, Jun [1 ]
Shao, Zhengzheng [2 ]
Zhang, Xueao [2 ]
Chang, Shengli [2 ]
Wang, Guang [2 ]
Qin, Shiqiao [2 ]
Li, Jingbo [1 ]
机构
[1] Chinese Acad Sci, Inst Semicond, State Key Lab Superlattice & Microstruct, Beijing 100083, Peoples R China
[2] Natl Univ Def Technol, Sch Sci, Changsha 410073, Hunan, Peoples R China
基金
中国国家自然科学基金;
关键词
Elastic constants; Band gap tuning; Strain; First-principles calculations; LAYER; EVOLUTION; DYNAMICS; WS2;
D O I
10.1016/j.physleta.2012.02.029
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We present our study on elastic constants and electronic structures of two-dimensional monolayer MoS2 under elastic strain using the first-principles calculations. The in-plane stiffness and Poisson's ratio calculated in the harmonic elastic strain range are found to be 123 N/m and 0.25, indicating that monolayer MoS2 is much softer than graphene. With the uniform strain applied, it is shown that the band gap of monolayer MoS2 undergoes a descent trend as strain increasing. Simultaneously, it is accompanied by two characteristic transitions, namely, direct-to-indirect transition at strain of 0.01 and semiconductor-to-metal transition at strain of 0.10. Furthermore, the effective mass of carriers is also modulated by the applied strain. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:1166 / 1170
页数:5
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