Stress mechanism of pulsed laser-driven damage in thin film under nanosecond ultraviolet laser irradiation

被引：26
作者：
Yu, Zhenkun [1 ,2 ]
He, Hongbo [1 ]
Li, Xu [1 ,2 ]
Qi, Hongji [1 ]
Liu, Wenwen [1 ,2 ]
机构：
[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
来源：
CHINESE OPTICS LETTERS | 2013年 / 11卷 / 07期
基金：
中国国家自然科学基金;
关键词：
THRESHOLD; MODEL;
D O I：
10.3788/COL201311.073101
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
An analytical model is derived to describe the stress mechanism in a thin film against the laser-induced damage threshold (MDT) based on the thermal transfer equation. Different structures of high-reflection films at 355 nm are prepared to validate this model. LIDTs are found to have a linear relationship with stress. Furthermore, predictions from the simple model agree with the experiments.
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页数：2
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