Enhanced Thermoelectric Properties in Cu-Doped c-Axis-Oriented Ca3Co4O9+ Thin Films

被引:20
|
作者
Wei, Renhuai [1 ]
Jian, Hongbin [1 ]
Tang, Xianwu [1 ]
Yang, Jie [1 ]
Hu, Ling [1 ]
Chen, Li [1 ]
Dai, Jianming [1 ]
Zhu, Xuebin [1 ]
Sun, Yuping [1 ,2 ]
机构
[1] Chinese Acad Sci, Inst Solid State Phys, Key Lab Mat Phys, Hefei 230031, Peoples R China
[2] Chinese Acad Sci, High Field Magnet Lab, Hefei 230031, Peoples R China
基金
中国国家自然科学基金;
关键词
TRANSITION-METALS; COBALT; GROWTH; THERMOPOWER; ORIENTATION; PROGRESS; FE; NI;
D O I
10.1111/jace.12415
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Highly c-axis-oriented Ca3Co4-xCuxO9+ (x=0, 0.1, 0.2, and 0.3) thin films were prepared by chemical solution deposition on LaAlO3 (001) single-crystal substrates. X-ray diffraction, field-emission scanning electronic microscopy, X-ray photoelectron spectroscopy, and ultraviolet-visible absorption spectrums were used to characterize the derived thin films. The solubility limit of Cu was found to be less than 0.2, above which [Ca-2(Co0.65Cu0.35)(2)O-4](0.624)CoO2 with quadruplicated rock-salt layers was observed. The electrical resistivity decreased monotonously with increasing Cu-doping content when x0.2, and then slightly increased with further Cu doping. The Seebeck coefficient was enhanced from similar to 100V/K for the undoped thin film to similar to 120V/K for the Cu-doped thin films. The power factor was enhanced for about two times at room temperature by Cu doping, suggesting that Cu-doped Ca3Co4O9+ thin films could be a promising candidate for thermoelectric applications.
引用
收藏
页码:2396 / 2401
页数:6
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