Effects of Substrate Miscut on the Quality of In0.3Ga0.7As Layers Grown on Metamorphic (Al)GaInP Buffers by Metal-Organic Chemical Vapor Deposition

被引:3
作者
Li, Kuilong [1 ,2 ]
Sun, Yurun [1 ,2 ]
Dong, Jianrong [1 ]
Zhao, Yongming [1 ]
Yu, Shuzhen [1 ]
Zhao, Chunyu [1 ]
Zeng, Xulu [1 ,2 ]
Yang, Hui [1 ]
机构
[1] Chinese Acad Sci, Key Lab Nanodevices & Applicat, Suzhou Inst Nanotech & Nanobion, Suzhou 215125, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
关键词
DISLOCATIONS; FILMS;
D O I
10.7567/APEX.6.065502
中图分类号
O59 [应用物理学];
学科分类号
摘要
In0.3Ga0.7As layers were grown by metal-organic chemical vapor deposition utilizing compositionally step-graded (Al)GaInP buffers on different misorientated GaAs substrates. The substrate miscut toward the [110] direction promotes alpha dislocation glide along the [110] direction while it exerts an adverse effect on beta dislocations in the perpendicular direction with increasing the miscut degree. In comparison with the 2 degrees and 7 degrees samples, a better surface morphology with a RMS roughness of 5.77 nm and a lower density of threading dislocations indicated by the photoluminescence and transmission electron microscopy results were obtained in the 15 degrees sample. (C) 2013 The Japan Society of Applied Physics
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页数:3
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