Development of nano-spherical RuO2 active material on AISI 317 steel substrate via pulse electrodeposition for supercapacitors

被引:14
作者
Arunachalam, R. [1 ]
Gnanamuthu, R. M. [2 ,3 ]
Al Ahmad, Mahmoud [2 ]
Mohan, S. [3 ]
Raj, R. Pavul [3 ]
Maharaja, J. [3 ]
Al Taradeh, Nedal [2 ]
Al-Hinai, Ashraf [4 ]
机构
[1] Sultan Qaboos Univ, Dept Mech & Ind Engn, Coll Engn, Al Khoud, Oman
[2] United Arab Emirates Univ, Coll Engn, Dept Elect Engn, Al Ain, U Arab Emirates
[3] CSIR Cent Electrochem Res Inst, EMFT Div, Karaikkudi 630006, Tamil Nadu, India
[4] Sultan Qaboos Univ, Dept Chem, Coll Sci, Al Khoud, Oman
关键词
Coatings; Nanostructures; Thin films; Electrochemical measurements; Energy storage; LITHIUM-ION BATTERIES; HYDROUS RUTHENIUM OXIDE; ELECTROCHEMICAL CAPACITORS; COMPOSITE ELECTRODES; ANODE MATERIALS; ALLOY; DEPOSITION; FILMS;
D O I
10.1016/j.surfcoat.2015.06.054
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The goal of the present study is to develop a thin film hydrous ruthenium oxide (RuO2) electrode material on Ni flashed AISI 317 stainless steel (SS) substrate by pulse electrodeposition (FED) technique for application in supercapacitors. The nickel (Ni) strike thin film is deposited prior to RuO2 in order to improve the adhesion of the active material on the SS substrate. The prepared RuO2 active material on Ni strike SS electrode is characterized using XRD, SEM with EDAX and electrochemically using cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS) using an IVIUM reference potentiostat. The surface morphologies of the thin film (thickness of 2.3 mu m) active materials are nano-spherical shaped and the particles are arranged uniformly without cracks on the SS substrate. The electrochemical impedance and CV profile demonstrates its superior characteristics in the electrochemical system. Moreover, the specific capacitance of RuO2 value is approximately 520 F g(-1) at the scan rate of 1 mV s(-1) and it's indicating a better utilization of active species in supercapacitors. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:336 / 340
页数:5
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