Direct fabrication and characterization of high-aspect-ratio plasmonic nanogratings using tapered-sidewall molds

被引：27

作者：

Ogawa, Shinpei ^{[1
]}

Kimata, Masafumi ^{[2
]}

机构：

[1] Mitsubishi Electr Corp, Adv Technol R&D Ctr, 8-1-1 Tsukaguchi Honmachi, Amagasaki, Hyogo 6618661, Japan

[2] Ritsumeikan Univ, Coll Sci & Engn, 1-1-1 Noji Higashi, Kusatsu, Shiga 5258577, Japan

来源：

OPTICAL MATERIALS EXPRESS | 2017年 / 7卷 / 02期

关键词：

Molds - Fabrication - Aspect ratio - Polarimeters - Semiconductor devices;

D O I：

10.1364/OME.7.000633

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

High-aspect-ratio plasmonic nanogratings are promising for applications such as infrared (IR) polarimetric detectors and IR emitters. Direct fabrication using conventional photolithography is necessary for their integration with other semiconductor devices. Nanogrooves with a high aspect ratio of 15 and a width of 100 nm were developed using a tapered-sidewall mold technique. Calculations and experimental measurements demonstrated that they have a strong wavelength-and polarization-selective absorption profile that is defined mainly by the groove depth, and that the FWHM of the absorbance can be controlled by the grating period. This study will contribute to the development of thermal polarimetric imaging and thermal emitters for gas sensing. (C) 2017 Optical Society of America

引用

页码：633 / 640

页数：8

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