Saddle-point construction in the design of lithographic objectives, part 1: method

被引:7
作者
Marinescu, Oana [1 ]
Bociort, Florian [1 ]
机构
[1] Delft Univ Technol, Opt Res Grp, NL-2628 CJ Delft, Netherlands
关键词
saddle point; lithography; optimization; optical system design; EUV; DUV;
D O I
10.1117/1.2981512
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The multidimensional merit function space of complex optical systems contains a large number of local minima. We illustrate a method to find new local minima by constructing saddle points, with examples of deep and extreme UV objectives. The central idea of the method is that, at certain positions in a system with N surfaces that is a local minimum, a thin meniscus lens or two mirror surfaces can be introduced to construct a system with N + 2 surfaces that is a saddle point. When optimization rolls down on the two sides of the saddle point, two minima are obtained. Often one of these two minima can also be reached from several other saddle points constructed in the same way. With saddle-point construction we can obtain new design shapes from existing ones in a simple, efficient, and systematic manner that is suitable for complex designs such as those for lithographic objectives. (C) 2008 Society of Photo-Optical Instrumentation Engineers. [DOI: 10.1117/1.2981512]
引用
收藏
页数:6
相关论文
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