Patterning polycrystalline thin films by defocused ion beam: The influence of initial morphology on the evolution of self-organized nanostructures

被引:44
作者
Toma, A. [1 ,2 ]
Batic, B. Setina [3 ]
Chiappe, D. [1 ,2 ]
Boragno, C. [1 ,2 ]
Valbusa, U. [1 ]
Godec, M. [3 ]
Jenko, M. [3 ]
de Mongeot, F. Buatier [1 ,2 ]
机构
[1] Univ Genoa, Dipartimento Fis, I-16146 Genoa, Italy
[2] CNISM, Unita Genova, I-16146 Genoa, Italy
[3] Inst Kovinske Mat Tehnol, Ljubljana 1000, Slovenia
关键词
diffusion; grain boundaries; ion beam effects; metallic thin films; nanopatterning; nanostructured materials; self-assembly; silver; surface morphology;
D O I
10.1063/1.3021100
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on self-organized patterning of polycrystalline noble metal films, supported on dielectric substrates, by defocused Ar+ ion beam irradiation. The initial surface morphology affects the formation of nanostructures, forcing the growth of ripples with a lateral periodicity imposed by the pristine polycrystalline grain distribution. At the early stages, the self-organization process is dominated by the shadowing of taller grains, while a crossover to the conventional erosive regime, observed for single crystals, sets in at longer sputtering times. The grain boundaries, although providing an additional bias for diffusion of mobile defects, do not affect the propagation of nanoscale ripples across individual grains.
引用
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页数:7
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