High angular resolution slope measuring deflectometry for the characterization of ultra-precise reflective x-ray optics

被引：12

作者：

Siewert, F. ^{[1
]}

Buchheim, J. ^{[1
]}

Hoeft, T. ^{[1
]}

Fiedler, S. ^{[2
]}

Bourenkov, G. ^{[2
]}

Cianci, M. ^{[2
]}

Signorato, R. ^{[3
]}

机构：

[1] Inst Nanometer Opt & Technol, Helmholtz Zentrum Berlin BESSY II, D-12489 Berlin, Germany

[2] DESY, EMBL Hamburg, D-22603 Hamburg, Germany

[3] Bruker ASC GmbH, D-51429 Bergisch Gladbach, Germany

来源：

MEASUREMENT SCIENCE AND TECHNOLOGY | 2012年 / 23卷 / 07期

关键词：

x-ray optics; synchrotron optics; metrology; bimorph mirror; adaptive optics; NOM; slope error; SYNCHROTRON-RADIATION; TOPOGRAPHY; PROFILER; MIRRORS;

D O I：

10.1088/0957-0233/23/7/074015

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Slope measuring deflectometry has become a standard technique for inspection of ultra-precise reflective optical elements of synchrotron applications. We will report on the inspection of ultra-precise adaptive synchrotron mirrors (bimorph mirrors) to be used under grazing incidence condition. The measurements were performed at the BESSY-II Optics Laboratory of the Helmholtz Zentrum Berlin using the nanometer optical component measuring machine (NOM). Based on the data obtained by the optical measurements, we in this paper simulate the characteristics of the achievable x-ray focus by ray tracing calculations, demonstrated in the case of bimorph mirrors of the EMBL MX1 beamline for macromolecular crystallography at DESY's synchrotron radiation source PETRA III in Hamburg.

引用

页数：8

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