Effect of indium doping on motions of ⟨a⟩-prismatic edge dislocations in wurtzite gallium nitride

被引:7
作者
Chen, Cheng [1 ]
Meng, Fanchao [1 ]
Ou, Pengfei [1 ]
Lan, Guoqiang [1 ]
Li, Bing [2 ]
Chen, Huicong [1 ]
Qiu, Qiwen [1 ]
Song, Jun [1 ]
机构
[1] McGill Univ, Dept Mat Engn, Montreal, PQ H3A 0C5, Canada
[2] Huzhou Univ, Sch Engn, Huzhou 313000, Peoples R China
基金
加拿大自然科学与工程研究理事会;
关键词
dislocation; mobility; InGaN; molecular dynamics; doping; MOLECULAR-DYNAMICS SIMULATIONS; A-PLANE GAN; THREADING DISLOCATIONS; SCREW DISLOCATIONS; SAPPHIRE; GROWTH; TEMPERATURE; OVERGROWTH; MOBILITY; ORDER;
D O I
10.1088/1361-648X/ab1bf3
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The influences of indium doping on dynamics of < a >-prismatic edge dislocation along (1 (1) over bar 0 0) [1 1 (2) over bar 0] shuffle plane in wurtzite GaN have been investigated employing classical molecular dynamics (MD) simulations. The dependence of dislocation motion mode and dislocation velocity on indium doping concentration, temperature, and applied shear stress was clarified. Moreover, the simulation results were further analyzed using elastic theory of dislocation and thermal activation theory of dislocation motion, showing excellent agreement with the simulation. Our findings help gain deep insights into modifying dynamic behaviors of TDs through the alloying doping and offer generic tools to the study of other wurtzite materials of promising application prospects, such as AlGaN and ZnO.
引用
收藏
页数:8
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