Realization of W-MgZnO epitaxial growth on BeO-buffered ZnO for UV-B photodetectors

被引:15
作者
Liang, H. L. [1 ,2 ,3 ]
Mei, Z. X. [1 ,2 ,3 ]
Hou, Y. N. [1 ,2 ,3 ]
Liang, S. [1 ,2 ,3 ]
Liu, Z. L. [1 ,2 ,3 ]
Liu, Y. P. [1 ,2 ,3 ]
Li, J. Q. [1 ,2 ,3 ]
Du, X. L. [1 ,2 ,3 ]
机构
[1] Chinese Acad Sci, Inst Phys, Key Lab Renewable Energy, Beijing 100190, Peoples R China
[2] Chinese Acad Sci, Inst Phys, Beijing Key Lab New Energy Mat & Devices, Beijing 100190, Peoples R China
[3] Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China
基金
美国国家科学基金会;
关键词
MBE; Photodetector; BeO; UV-B; W-MgZnO; THIN-FILMS; BLIND;
D O I
10.1016/j.jcrysgro.2013.07.001
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
A single-phase wurtzite MgZnO film with an optical band gap of 294.5 nm was synthesized on ZnO substrate by molecular beam epitaxy, and a photodetector was fabricated working in the ultraviolet-B spectrum region. Wurtzite BeO was adopted to restrain the substrate response as an insulating layer and provide an excellent epitaxial template for high-Mg-content MgZnO growth. In situ reflection high-energy electron diffraction observations, ex situ X-ray diffraction and reflectance spectrum indicate the achievement of high-quality single-phase wurtzite MgZnO with smooth surface and deep ultraviolet band gap. The BeO layer efficiently suppresses the photoresponse from the substrate, as the photo-detector demonstrates a sharp cutoff at 290 nm, consistent with the optical band gap. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:6 / 9
页数:4
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