Molecular beam epitaxial growths of high-optical-gain InAs quantum dots on GaAs for long-wavelength emission

被引:31
|
作者
Nishi, K. [1 ,3 ]
Kageyama, T. [1 ]
Yamaguchi, M. [1 ,2 ]
Maeda, Y. [1 ]
Takemasa, K. [1 ]
Yamamoto, T. [1 ,2 ,3 ]
Sugawara, M. [1 ,3 ]
Arakawa, Y. [3 ,4 ]
机构
[1] QD Laser Inc, Kawasaki Ku, Kawasaki, Kanagawa 2100855, Japan
[2] Fujitsu Labs Ltd, Atsugi, Kanagawa 2430197, Japan
[3] Univ Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
[4] Univ Tokyo, Inst Ind Sci, Meguro Ku, Tokyo 1538505, Japan
关键词
Low dimensional structures; Molecular beam epitaxy; Semiconducting III-V materials; Laser diodes; 1.3; MU-M; THRESHOLD CURRENT; ROOM-TEMPERATURE; PHOTOLUMINESCENCE; LASERS;
D O I
10.1016/j.jcrysgro.2012.12.046
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Uniform InAs quantum dots (QDs) have been realized on GaAs by molecular beam epitaxy, which can increase maximum optical gain in laser diodes without sacrificing original high-density and high optical quality characteristics. This improvement enables laser operation under higher environment temperature. In order to improve QD uniformity, we searched for a proper growth condition and sequence for suppressing In out-diffusion during QD coverage. Although the same initial InAs QD structure on GaAs was used, PL linewidth was reduced after coverage under such improved conditions. In QD lasers, higher optical gain as large as 54 cm(-1) at room temperature which is about 10 cm(-1) larger than our previous data was realized. Those improved QDs are attractive for realizing novel optical devices. (c) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:459 / 462
页数:4
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