Craniofacial morphology in unilateral hemifacial microsomia

被引:22
作者
Ongkosuwito, E. M. [1 ]
van Neck, J. W. [2 ]
Wattel, E. [3 ]
van Adrichem, L. N. [2 ]
Kuijpers-Jagtman, A. M. [4 ]
机构
[1] Univ Med Ctr, Erasmus MC Sophia, Dept Orthodont, NL-3000 CB Rotterdam, Netherlands
[2] Univ Med Ctr, Erasmus MC, Dept Plast & Reconstruct Surg, NL-3000 CA Rotterdam, Netherlands
[3] Vrije Univ, Dept Sci, Sect Geometry, NL-1081 HV Amsterdam, Netherlands
[4] Radboud Univ Nijmegen, Med Ctr, Dept Orthodont & Craniofacial Biol, NL-6500 HB Nijmegen, Netherlands
关键词
Facial asymmetry; Alveolar process; Neural crest; Cephalometry; MANDIBULAR ASYMMETRY; SURGICAL-CORRECTION; INTEGRATION; HYPOPLASIA; MAXILLARY; GROWTH; AID;
D O I
10.1016/j.bjoms.2012.10.011
中图分类号
R78 [口腔科学];
学科分类号
1003 ;
摘要
Hemifacial microsomia (HFM) is a complex three-dimensional congenital condition that is characterized by mandibular hypoplasia and unilateral or bilateral microtia; although, other facial structures may be affected. Little is known about craniofacial growth and morphology in patients with HFM; therefore, we examined 75 HFM patients by means of a cephalometric analysis in a longitudinal study on serial lateral cephalograms. We hypothesized that the growth of several facial structures on both sides of HFM patients would be different compared to Dutch controls. We determined patients with HEM had more retruded mandibles and maxillae and a more vertical morphology compared to the reference population. In addition, there was a more retruded and vertical pattern on the affected side compared to the unaffected side and in patients with a severe condition compared to those with a mild condition. 'Mild' HFM patients were more similar to the Dutch reference population than the 'severe' HFM patients. Individual HFM growth curves showed very high inter-variability, further strengthening the need for individualized treatment plans that consider all three dimensions and the severity of the condition. (C) 2012 The British Association of Oral and Maxillofacial Surgeons. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:902 / 907
页数:6
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