High-pressure electronic and optical properties of α-Si3N4

被引:0
|
作者
Chen Changchun [1 ]
Geng Xiaoju [1 ]
Li Yingbin [1 ]
Yu Benhai [1 ]
Chen Dong [1 ]
机构
[1] Xinyang Normal Univ, Coll Phys & Elect Engn, Xinyang 464000, Peoples R China
来源
ADVANCED MATERIALS, PTS 1-3 | 2012年 / 415-417卷
关键词
first-principles; dielectric function; band structure; ALPHA-SILICON NITRIDE; CRYSTAL-STRUCTURE;
D O I
10.4028/www.scientific.net/AMR.415-417.2288
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Based on the density functional theory, the plane-wave pseudo-potential method is performed to investigate the structural properties of alpha-Si3N4. The ground-state lattice parameters (i.e. lattice constants and cell volume) agree quite well with the experimental data. From the band structure calculation, we found that the stability of alpha-Si3N4 is due mainly to the interaction among the Si-s, Si-p and N-p states. The imaginary part of the dielectric function has a sharp peak at 8.2eV. For the real part of the dielectric function, the highest peak locates at 6.5eV. Our calculated results are in good agreement with the experimental data and previous theoretical values. Therefore, the calculated results may provide useful information for further investigations of alpha-Si3N4.
引用
收藏
页码:2288 / 2291
页数:4
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