Deposition of DLC film from adamantane by using pulsed discharge plasma CVD

被引：16

作者：

Umeno, A. ^{[1
]}

Noda, M. ^{[1
]}

Uchida, H. ^{[1
]}

Takeuchi, H. ^{[1
]}

机构：

[1] Chubu Univ, Elect & Informat Engn Dept, Kasugai, Aichi 4878501, Japan

来源：

关键词：

diamond like carbon; plasma CVD; optical properties;

D O I：

10.1016/j.diamond.2008.01.118

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Diamond like carbon films are deposited on silicon and quartz substrates using adamantane as a sole source of carbon by pulsed discharge plasma chemical vapor deposition. Tauc band gap of such films has been successfully tuned from 1.7eV to 2.9eV. Iodine incorporation is observed to favor the growth of such films and induces disorder in the films. It also brings down in energy the on-set of photon absorption. Such iodine incorporated diamond like carbon films may be interesting candidates for the new coming applications such as for heterojunction photovoltaic devices. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：684 / 687

页数：4

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