A forevacuum pulse arc-discharge-based plasma electron source

被引:19
作者
Kazakov, A. V. [1 ]
Burdovitsin, V. A. [1 ]
Medovnik, A. V. [1 ]
Oks, E. M. [1 ]
机构
[1] Tomsk State Univ Control Syst & Radio Elect, Tomsk 634050, Russia
基金
俄罗斯基础研究基金会;
关键词
Electron Source; Current Density Distribution; Cathode Spot; Pulse Electron Beam; Beam Current Density;
D O I
10.1134/S0020441213060043
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
An arc-discharge-based electron source is described, which is designed for forming a pulsed wideaperture electron beam in the forevacuum pressure range (4-15 Pa). At an accelerating voltage of 12 kV, a current of 80 A was extracted from the emitting surface with an area of 80 cm(2) in the submillisecond range of pulse durations. The current density distribution over the beam cross section is close to a Gaussian function, and the surface-averaged beam energy density in a pulse reached 10 J/cm(2).
引用
收藏
页码:680 / 683
页数:4
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