A spin metal-oxide-semiconductor field-effect transistor using half-metallic-ferromagnet contacts for the source and drain

被引:352
作者
Sugahara, S
Tanaka, M
机构
[1] Univ Tokyo, Dept Elect Engn, Bunkyo Ku, Tokyo 1138656, Japan
[2] JST, PRESTO, Kawaguchi, Saitama 3320012, Japan
关键词
D O I
10.1063/1.1689403
中图分类号
O59 [应用物理学];
学科分类号
摘要
We propose and theoretically analyze a metal-oxide-semiconductor field-effect-transistor (MOSFET) type of spin transistor (spin MOSFET) consisting of a MOS structure and half-metallic-ferromagnet (HMF) contacts for the source and drain. When the magnetization configuration of the HMF source and drain is parallel (antiparallel), highly spin-polarized carriers injected from the HMF source to the channel are transported into (blocked by) the HMF drain, resulting in the magnetization-configuration-dependent output characteristics. Our two-dimensional numerical analysis indicates that the spin MOSFET exhibits high (low) current drive capability in the parallel (antiparallel) magnetization, and that extremely large magnetocurrent ratios can be obtained. Furthermore, the spin MOSFET satisfies other important requirements for "spintronic integrated circuits," such, as high amplification capability, low power-delay product, and low off-current. (C) 2004 American Institute of Physics.
引用
收藏
页码:2307 / 2309
页数:3
相关论文
共 21 条
[1]   LIMITATIONS ON THE PERFORMANCE OF FIELD-EFFECT DEVICES FOR LOGIC APPLICATIONS [J].
COOPER, JA .
PROCEEDINGS OF THE IEEE, 1981, 69 (02) :226-231
[2]   ELECTRONIC ANALOG OF THE ELECTROOPTIC MODULATOR [J].
DATTA, S ;
DAS, B .
APPLIED PHYSICS LETTERS, 1990, 56 (07) :665-667
[3]   NEW CLASS OF MATERIALS - HALF-METALLIC FERROMAGNETS [J].
DEGROOT, RA ;
MUELLER, FM ;
VANENGEN, PG ;
BUSCHOW, KHJ .
PHYSICAL REVIEW LETTERS, 1983, 50 (25) :2024-2027
[4]   NUMERICAL-SIMULATION OF TUNNEL EFFECT TRANSISTORS EMPLOYING INTERNAL FIELD-EMISSION OF SCHOTTKY-BARRIER JUNCTION [J].
HATTORI, R ;
SHIRAFUJI, J .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (1B) :612-618
[5]   CMOS technology - Year 2010 and beyond [J].
Iwai, H .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1999, 34 (03) :357-366
[6]   Downsizing of silicon MOSFETs beyond 0.1 μm [J].
Iwai, H .
MICROELECTRONICS JOURNAL, 1998, 29 (10) :671-678
[7]  
JOHONSON M, 1993, PHYS REV LETT, V70, P2142
[8]   SB-IGFET - AN INSULATED-GATE FIELD-EFFECT TRANSISTOR USING SCHOTTKY BARRIER CONTACTS FOR SOURCE AND DRAIN [J].
LEPSELTER, MP ;
SZE, SM .
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1968, 56 (08) :1400-+
[9]  
MATSUNO T, 2003, 9 S PHYS APPL SPIN R, P225
[10]   Energy-dependent hot electron transport across a spin-valve [J].
Mizushima, K ;
Kinno, T ;
Yamauchi, T ;
Tanaka, K .
IEEE TRANSACTIONS ON MAGNETICS, 1997, 33 (05) :3500-3504