Impact of source pocket doping on RF and linearity performance of a cylindrical gate tunnel FET

被引:15
作者
Dash, Sidhartha [1 ]
Lenka, Annada Shankar [2 ]
Jena, Biswajit [1 ]
Mishra, Guru Prasad [1 ]
机构
[1] Siksha O Anusandhan Univ, Dept Elect & Commun Engn, Device Simulat Lab, Bhubaneswar, India
[2] Siksha O Anusandhan Univ, Dept Elect & Instrumentat Engn, Bhubaneswar, India
关键词
drain current; linearity performance; pocket doping engineering; radio frequency parameters; DRAIN CURRENT MODEL; FIELD-EFFECT TRANSISTORS; ANALOG/RF PERFORMANCE; NANOWIRE MOSFETS; TFET; UNDERLAP; DESIGN;
D O I
10.1002/jnm.2283
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The paper presents a cylindrical gate tunnel (CGT) field effect transistors (FETs) with a highly doped pocket layer introduced in the source region. The presence of pocket doped layer in the source provides higher lateral electric field and band-to-band tunneling (BTBT) generation rate in the vicinity of tunneling junction which in turn increases the drain current and transconductance significantly. Also, the linearity and radio frequency (RF) performance of the CGT FET with source pocket doping (CGTS) have been extensively investigated. The different linearity and RF figure of merits such as g(mn), VIP2, VIP3, IIP3, ZCP, 1-dB compression point, GBWP, TFP, unity gain cut-off frequency, and maximum oscillation frequency of the present device are extracted and compared with the results of conventional CGT. The results exhibit superior linearity and RF performance along with improved current carrying capability of the proposed device. Thus, the device can be one of the possible contenders to replace bulk MOSFET in high-frequency microwave applications. The accuracy of both the devices is validated by TCAD Sentaurus simulator.
引用
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页数:14
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